Water Vapor Permeation Properties of Al2O3/TiO2Passivation Layer Deposited by Atomic Layer Deposition

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition

The tuning of structural, optical, and electrical properties of Al-doped ZnO films deposited by atomic layer deposition technique is reported in this work. With the increasing Al doping level, the evolution from (002) to (100) diffraction peaks indicates the change in growth mode of ZnO films. Spectroscopic ellipsometry has been applied to study the thickness, optical constants, and band gap of...

Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition

In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...

Atomic Layer Deposition of TiO

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Grain boundary structures of atomic layer deposited

Grain boundary plays an important role in determining the physical properties and chemical stability of the materials. In particular, the structures of grain boundaries in atomic layer deposited TiN film may be one of the main factors to dominate the reliability and performance of ULSI devices with multilayer structure of Cu-based interconnects. In this work, the characteristics of grain bounda...

Atomic layer deposition: an overview.